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dc.creatorBedoya-Hincapié,Claudia Milena
dc.creatorde la Roche,Jhonattan
dc.creatorRestrepo-Parra,Elisabeth
dc.creatorAlfonso,José Edgar
dc.creatorOlaya-Florez,Jhon Jairo
dc.date2015-01-01
dc.date.accessioned2019-04-24T21:28:45Z
dc.date.available2019-04-24T21:28:45Z
dc.identifierhttps://scielo.conicyt.cl/scielo.php?script=sci_arttext&pid=S0718-33052015000100011
dc.identifier.urihttp://revistaschilenas.uchile.cl/handle/2250/59067
dc.descriptionBismuth thin films were grown onto glass substrates through the DC magnetron sputtering technique. The effects of substrate temperature on the microstructure of the films were evaluated. The structural behavior was analyzed via X-ray diffraction, and it showed a marked influence of the substrate temperature on the crystallite size and the micro-stress. The morphologies evaluated through Electron Probe Micro-analyzer images indicated a slight difference in the grain size with an increase in temperature as well as a significant increase in surface roughness, according to profilometer measurements.
dc.formattext/html
dc.languageen
dc.publisherUniversidad de Tarapacá.
dc.relation10.4067/S0718-33052015000100011
dc.rightsinfo:eu-repo/semantics/openAccess
dc.sourceIngeniare. Revista chilena de ingeniería v.23 n.1 2015
dc.subjectBismuth
dc.subjectthin film
dc.subjectthermal effects
dc.subjectsputtering
dc.subjectmicrostructure
dc.titleStructural and morphological behavior of bismuth thin films grown through DC-magnetron sputtering


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